We can design and Engineer and supply EPS which can handle any toxic and flammable chemicals with suitable system design and material selection to meet the stringent requirement of Oil & Gas and Refinery standards.
During chemical vapour infiltration, the fibrous preform is supported on a porous metallic plate through which a mixture of carrier gas along with matrix material is passed at an elevated temperature. The preforms can be made using yarns or woven fabrics or they can be filament-wound or braided three-dimensional shapes. The infiltration takes place in a reactor which is connected to an effluent-treatment plant where the gases and residual matrix material are chemically treated. Induction heating is used in a conventional isothermal and isobaric CVI.
Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high quality, high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.
Microfabrication processes widely use CVD to deposit materials in various forms, including: monocrystalline, polycrystalline, amorphous, and epitaxial. These materials include: silicon (dioxide, carbide, nitride, oxynitride), carbon (fiber, nanofibers, nanotubes, diamond and graphene), fluorocarbons, filaments, tungsten, titanium nitride and various high-k dielectrics.
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